1. System description

For copper alloy and other materials,the resistivity is very sensitive to the atom diffusion during tempering. Through the resistance temperature dependent characters, the system can accurately capture a series of continuous transformation  such as atoms moving from interstitial position to dislocation, interface enrichment and nucleation, and precipitation from the matrix. These explain the diffusion kinetics from the perspective of carbon atom diffusion activation energy. However,  the in-situ characterization of subtle  resistance value is still a challenge.

2. Parameters

        1) Temperature controller:30 heating modes; Room temperature measurement; accuracy: ±0.2℃.

        2) Vacuum degree: 6*10^-2Pa.

        3) Data acquisition range : 1×10^-7～1×10^1 Ω and accuracy: 0.1uΩ.

        4) Standard samples: 1mΩ、10mΩ、100mΩ, uncertainty: 0.05%, temperature cofficient of resistance: 3ppm.

3. Software function: save and manage the data with ACCESS.

Tel:(086)13338002060 (Engineer Zhang); QQ:2429337838;Email:jinfeng.zhang@sipcc.com.cn