1. System description

For copper alloy and other materials such as Ni-Cr alloy, temperature coefficient resistance is a key parameter of application. The resistivity is very sensitive to the atom diffusion during tempering. Through the resistance temperature dependent characters, the system can accurately capture a series of continuous transformation features such as atoms moving from interstitial position to dislocation, interface enrichment and nucleation, and precipitation from the matrix. These can explain the best tempering process for TCR.

2. Parameters

        1) Temperature controller:30 heating modes; Room temperature~400℃,  accuracy: ±0.2℃.

        2) Vacuum degree: 6*10^-2Pa.

        3) Data acquisition range : 1×10^-7～1×10^1 Ω and accuracy: 0.1uΩ.

        4) Standard samples: 1mΩ、10mΩ、100mΩ, uncertainty: 0.05%, temperature cofficient of resistance: 3ppm.

3. Software function: save and manage the data with ACCESS.

Tel:(086)13338002060 (Engineer Zhang); QQ:2429337838;Email:jinfeng.zhang@sipcc.com.cn